Ever wondered how imaging and characterisation tools work to provide insights on device failure?
Participants of this introductory course will be equipped with fundamental knowledge on microscopy and thin film characterisation for failure analysis. There will also be hands-on opportunities and demonstrations during lesson to facilitate learning.
Upon completion, participants will be better able to understand the working principles and applications of microscopes and thin film characterisation tools for failure analysis.
Learning Objectives
By the end of the course, participants will be able to:
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Explain how microscopy and thin film characterisation are commonly used in
the semiconductor, manufacturing, and coating industries
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Understand the working principles and differences of various microscopes and thin film
characterisation tools for an effective failure analysis
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Demonstrate an understanding for a) various types of microscopes (such as optical and electron microscopes) and recognise the relationship among magnification, resolution, and depth of field for an effective imaging; b) various thin film characterisation tools (such as ellipsometer and four-point probe) to obtain important properties of thin film or coating
Who Should Attend?
Engineering or technical personnel who are interested to learn about microscopy and thin film characterisation tools for failure analysis.
Entry Requirement
Participants are expected to be familiar with the general operation of a personal computer (PC) or Macintosh (MAC), such as browsing the internet, opening, and saving files, etc.
Certification
Participants will be awarded a certificate of completion upon meeting the 75% course attendance requirement.
For courses with formal assessment component, participants will be awarded the certification of completion upon passing the assessment. Otherwise, a certification of attendance will be issued instead upon meeting the 75% course attendance requirement.
Trainer's Profile
Mr. Lau Gih Sheng joined Republic Polytechnic (RP) in 2008 and is currently a senior lecturer in the School of Engineering under the Diploma in Electrical and Electronics Engineering. As an educator, he developed a module on measurement techniques and failure analysis for both full-time and part-time students.
Prior to joining RP, Mr. Lau was a Materials Science and Characterisation Laboratory Research Fellow in the Institute of Materials Research & Engineering at A*STAR. Between 2002 to 2005, he worked on multiple materials characterisations as well as research and development projects involving thin film coatings.
Mr. Lau is also experienced in Failure Analysis (FA). He was employed by Chartered Semiconductor Manufacturing Limited where he worked as a Senior Process Integration Engineer for two years and spent significant time in the FA department performing failure analysis.
Course Dates
We are sorry that we do not have any open course runs at the moment. Please register your interest and we will contact you when the next run becomes available.
Course Duration
1 day (8 hours, with breaks)
Course Venue
Republic Polytechnic
Fees for 2022
Full Course Fees (with GST) |
Singapore Citizens aged 39 & below OR Singapore PR |
Singapore Citizens aged 40 & above |
SME-sponsored Singapore Citizens OR Singapore PR |
$358.45 |
$107.54 |
$35.85 |
$40.54 |
Fees for 2023
Full Course Fees (with GST) |
Singapore Citizens aged 39 & below |
Singapore Citizens aged 40 & above |
Singapore PR |
SME-sponsored Singapore Citizens |
SME-sponsored Singapore PR |
$361.80 |
$107.54 |
$35.85 |
$108.54 |
$40.54 |
$41.54 |
Notes:
- Payment may be made using SkillsFuture Credit.
- Fees reflected are inclusive of Goods and Services Tax (GST). In line with the government fee freeze directive from 1 Jan to 31 Dec 2023, the fees in 2023 for Singapore Citizen will remain the same as 2022. RP will absorb the additional 1% GST for Singapore Citizen in 2023 only.
Republic Polytechnic reserves the right to make changes to the course fee and application closing dates without prior notice. The commencement of each course is subject to sufficient number of participants.
All information is accurate at time of publishing.